Litho-and-Overlay
Lithography and overlay control.
Autonomous operations layer for semiconductor front-end wafer fabrication: litho, etch, deposition and CMP control, AI defect classification and virtual metrology.
Waferira runs the wafer fab: autonomous litho, etch, deposition and CMP control, AI defect classification, virtual metrology and run-to-run APC, yield-weighted dispatch and AMHS handling, and an as-run fab twin that hits yield, uniformity and cycle time before the lot runs.
Autonomy is set per agent rather than switched on for the whole plant, and agents negotiate contested moves through arbitration rules instead of colliding.
| Detail | Value |
|---|---|
| Stage | Seed |
| Funded | 2026 |
| Round | $1M |
| Sector | Applied AI |
| Headquarters | London, United Kingdom |
| Website | waferira.com |
| Investor | 10xC |
Lithography and overlay control.
Etch and deposition control.
CMP and implant control.
Clean and diffusion control.
AI defect classification.
Virtual metrology and run-to-run APC.
Yield-weighted dispatch.
AMHS and robotic handling.
Quality and conformance.
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